MCQOPTIONS
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This section includes 23 Mcqs, each offering curated multiple-choice questions to sharpen your Vlsi knowledge and support exam preparation. Choose a topic below to get started.
| 1. |
_______ is sputtered on the whole wafer. |
| A. | silicon |
| B. | calcium |
| C. | potassium |
| D. | aluminium |
| Answer» E. | |
| 2. |
N-well is formed by __________ |
| A. | decomposition |
| B. | diffusion |
| C. | dispersion |
| D. | filtering |
| Answer» C. dispersion | |
| 3. |
Which type of CMOS circuits are good and better? |
| A. | p well |
| B. | n well |
| C. | all of the mentioned |
| D. | none of the mentioned |
| Answer» C. all of the mentioned | |
| 4. |
P-well doping concentration and depth will affect the __________ |
| A. | threshold voltage |
| B. | Vss |
| C. | Vdd |
| D. | Vgs |
| Answer» B. Vss | |
| 5. |
Few parts of photoresist layer is removed by using __________ |
| A. | acidic solution |
| B. | neutral solution |
| C. | pure water |
| D. | diluted water |
| Answer» B. neutral solution | |
| 6. |
In CMOS fabrication, the photoresist layer is exposed to __________ |
| A. | visible light |
| B. | ultraviolet light |
| C. | infra red light |
| D. | fluorescent |
| Answer» C. infra red light | |
| 7. |
Photoresist layer is formed using __________ |
| A. | high sensitive polymer |
| B. | light sensitive polymer |
| C. | polysilicon |
| D. | silicon di oxide |
| Answer» C. polysilicon | |
| 8. |
Oxidation process is carried out using __________ |
| A. | hydrogen |
| B. | low purity oxygen |
| C. | sulphur |
| D. | nitrogen |
| Answer» B. low purity oxygen | |
| 9. |
P-well is created on __________ |
| A. | p substrate |
| B. | n substrate |
| C. | p & n substrate |
| D. | none of the mentioned |
| Answer» C. p & n substrate | |
| 10. |
CMOS has __________ |
| A. | high noise margin |
| B. | high packing density |
| C. | high power dissipation |
| D. | high complexity |
| Answer» C. high power dissipation | |
| 11. |
CMOS technology is used in developing which of the following? |
| A. | microprocessors |
| B. | microcontrollers |
| C. | digital logic circuits |
| D. | all of the mentioned |
| Answer» E. | |
| 12. |
WHICH_TYPE_OF_CMOS_CIRCUITS_ARE_GOOD_AND_BETTER??$ |
| A. | p well |
| B. | n well |
| C. | all of the mentioned |
| D. | none of the mentioned |
| Answer» C. all of the mentioned | |
| 13. |
_______ is sputtered on the whole wafer$ |
| A. | silicon |
| B. | calcium |
| C. | potassium |
| D. | aluminium |
| Answer» E. | |
| 14. |
N-well is formed by$ |
| A. | decomposition |
| B. | diffusion |
| C. | dispersion |
| D. | filtering |
| Answer» C. dispersion | |
| 15. |
P-well doping concentration and depth will affect th? |
| A. | threshold voltage |
| B. | Vss |
| C. | Vdd |
| D. | Vgs |
| Answer» B. Vss | |
| 16. |
Few parts of photoresist layer is removed by using |
| A. | acidic solution |
| B. | neutral solution |
| C. | pure water |
| D. | diluted water |
| Answer» B. neutral solution | |
| 17. |
In CMOS fabrication,the photoresist layer is exposed to |
| A. | visible light |
| B. | ultraviolet light |
| C. | infra red light |
| D. | fluorescent |
| Answer» C. infra red light | |
| 18. |
Photoresist layer is formed using |
| A. | high sensitive polymer |
| B. | light sensitive polymer |
| C. | polysilicon |
| D. | silicon di oxide |
| Answer» C. polysilicon | |
| 19. |
Oxidation process is carried out using |
| A. | hydrogen |
| B. | low purity oxygen |
| C. | sulphur |
| D. | nitrogen |
| Answer» B. low purity oxygen | |
| 20. |
P-well is created on |
| A. | p subtrate |
| B. | n substrate |
| C. | p & n substrate |
| D. | none of the mentioned |
| Answer» C. p & n substrate | |
| 21. |
In CMOS fabrication, nMOS and pMOS are integrated in same substrate. |
| A. | true |
| B. | false |
| Answer» B. false | |
| 22. |
CMOS has |
| A. | high noise margin |
| B. | high packing density |
| C. | high power dissipation |
| D. | high complexity |
| Answer» C. high power dissipation | |
| 23. |
CMOS technology is used in developing |
| A. | microprocessors |
| B. | microcontrollers |
| C. | digital logic circuits |
| D. | all of the mentioned |
| Answer» E. | |