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				| 1. | To grow the polysilicon gate layer, which of the following chemical is used for chemical vapour deposition? | 
| A. | Silicon Nitride(Si<sub>3</sub>N<sub>4</sub>) | 
| B. | Silane gas(SiH<sub>4</sub>) | 
| C. | Silicon oxide | 
| D. | None of the mentioned | 
| Answer» C. Silicon oxide | |