 
			 
			MCQOPTIONS
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				| 1. | The dopants are introduced in the active areas of silicon by: | 
| A. | Diffusion process | 
| B. | Ion Implantaion process | 
| C. | Chemical Vapour Deposition | 
| D. | Either Diffusion or Ion Implantaion Process | 
| Answer» E. | |