Silicon oxide is patterned on a substrate using: – McqOptions

MCQOPTIONS

1.	Silicon oxide is patterned on a substrate using:
A.	Physical lithography
B.	Photolithography
C.	Chemical lithography
D.	Mechanical lithography
Answer» C. Chemical lithography

Discussion

No Comment Found

Related MCQs

What is Piranha Solution?
Gate oxide layer consists of ___________
Chemical Mechanical Polishing is used to ___________
Which process is involved in growing the shaded region?a) Chemical vapor deposition (CVD)b) Sputtering and patterned by etchingc) Chemical vapor deposition (CVD) and patterned by HF acid etchingd) Chemical vapor deposition (CVD) and patterned by dry (plasm
The process by which Aluminium is grown over the entire wafer, also filling the contact cuts is?
To grow the polysilicon gate layer, which of the following chemical is used for chemical vapour deposition?
The dopants are introduced in the active areas of silicon by using which process?
The chemical used for shielding the active areas to achieve selective oxide growth is?
The isolated active areas are created by technique known as ___________
The ______ is used to reduce the resistivity of poly silicon.