 
			 
			MCQOPTIONS
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				This section includes 21 Mcqs, each offering curated multiple-choice questions to sharpen your Vlsi knowledge and support exam preparation. Choose a topic below to get started.
| 1. | One pass transistor can be driven through output of another. | 
| A. | true | 
| B. | false | 
| Answer» C. | |
| 2. | Using _____ long wires are possible. | 
| A. | silicide | 
| B. | metal | 
| C. | polysilicon | 
| D. | diffusion | 
| Answer» B. metal | |
| 3. | Propogation delay is given by | 
| A. | nrcƮ | 
| B. | n2rcƮ | 
| C. | nr2cƮ | 
| D. | n2cƮ | 
| Answer» C. nr2cƮ | |
| 4. | If f assumes the value e then delay is | 
| A. | maximized | 
| B. | minimized | 
| C. | does not change | 
| D. | doubled | 
| Answer» C. does not change | |
| 5. | Which is used to increase Ʈ? | 
| A. | parasitic capacitance | 
| B. | peripheral capacitance | 
| C. | area capacitance | 
| D. | load capacitance | 
| Answer» B. peripheral capacitance | |
| 6. | What is the delay value Ʈ for 1.2 micron technology? | 
| A. | 0.1 nsec | 
| B. | 0.12 nsec | 
| C. | 0.046 nsec | 
| D. | 0.064 nsec | 
| Answer» D. 0.064 nsec | |
| 7. | 1 square Cg is ___________ of MOS transistor. | 
| A. | gate to source capacitance | 
| B. | gate to drain capacitance | 
| C. | source to drain capacitance | 
| D. | gate to channel capacitance | 
| Answer» E. | |
| 8. | PROPOGATION_DELAY_IS_GIVEN_BY?$ | 
| A. | nrcƮ | 
| B. | n<sup>2</sup>rcƮ | 
| C. | nr<sup>2</sup>cƮ | 
| D. | n<sup>2</sup>cƮ | 
| Answer» C. nr<sup>2</sup>c‚Äö√†√ú‚àö√ú | |
| 9. | One pass transistor can be driven through output of another.$ | 
| A. | true | 
| B. | false | 
| Answer» C. | |
| 10. | Using _____ long wires are possible$ | 
| A. | silicide | 
| B. | metal | 
| C. | polysilicon | 
| D. | diffusion | 
| Answer» B. metal | |
| 11. | Maximum allowable current density in aluminium is | 
| A. | 0.1 mA/µm2 | 
| B. | 0.5 mA/µm2 | 
| C. | 2 mA/µm2 | 
| D. | 1 mA/µm2 | 
| Answer» E. | |
| 12. | Pass transistors are allowed to be constructed under | 
| A. | diffusion layer | 
| B. | polysilicon layer | 
| C. | metal layer | 
| D. | silicon layer | 
| Answer» D. silicon layer | |
| 13. | If f assumes the value e then delay i? | 
| A. | maximized | 
| B. | minimized | 
| C. | does not change | 
| D. | doubled | 
| Answer» C. does not change | |
| 14. | The number of stages N is given by | 
| A. | ln(y)/ln(f) | 
| B. | ln(f)/ln(y) | 
| C. | ln(2y)/ln(f) | 
| D. | ln(y)/ln(2f) | 
| Answer» B. ln(f)/ln(y) | |
| 15. | The inverter pair delay is given by | 
| A. | (Zp.u./Zp.d.)Ʈ | 
| B. | (1+ Zp.u./Zp.d.)Ʈ | 
| C. | (1+ Zp.u./Zp.d.)Ʈ | 
| D. | (1+ Ʈ)Zp.u./Zp.d. | 
| Answer» C. (1+ Zp.u./Zp.d.)‚Äö√†√ú‚àö√ú | |
| 16. | Which is used to increase Ʈ?$ | 
| A. | parasitic capacitance | 
| B. | peripheral capacitance | 
| C. | area capacitance | 
| D. | load capacitance | 
| Answer» B. peripheral capacitance | |
| 17. | What is the delay value Ʈ for 1.2 micron technology?$ | 
| A. | 0.1 nsec | 
| B. | 0.12 nsec | 
| C. | 0.046 nsec | 
| D. | 0.064 nsec | 
| Answer» D. 0.064 nsec | |
| 18. | 1 square Cg is ______ of MOS transistor | 
| A. | gate to source capacitance | 
| B. | gate to drain capacitance | 
| C. | source to drain capacitance | 
| D. | gate to channel capacitance | 
| Answer» E. | |
| 19. | What is the value for peripheral capacitance for 5 micron technology? | 
| A. | 4 x 10<sup>(-4)</sup> pf/µm2 | 
| B. | 5 x 10<sup>(-4)</sup> pf/µm2 | 
| C. | 8 x 10<sup>(-4)</sup> pf/µm2 | 
| D. | 12 x 10<sup>(-4)</sup> pf/µm2 | 
| Answer» D. 12 x 10<sup>(-4)</sup> pf/¬¨¬®¬¨¬µm2 | |
| 20. | The impedance ratio for pseudo-nMOS is | 
| A. | 4:1 | 
| B. | 3:1 | 
| C. | 1:4 | 
| D. | 1:3 | 
| Answer» C. 1:4 | |
| 21. | The Zp.u./Zp.d. ratio for nMOS inverter is | 
| A. | 4:1 | 
| B. | 3:1 | 
| C. | 1:4 | 
| D. | 1:3 | 
| Answer» B. 3:1 | |