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This section includes 21 Mcqs, each offering curated multiple-choice questions to sharpen your Vlsi knowledge and support exam preparation. Choose a topic below to get started.
1. |
One pass transistor can be driven through output of another. |
A. | true |
B. | false |
Answer» C. | |
2. |
Using _____ long wires are possible. |
A. | silicide |
B. | metal |
C. | polysilicon |
D. | diffusion |
Answer» B. metal | |
3. |
Propogation delay is given by |
A. | nrcƮ |
B. | n2rcƮ |
C. | nr2cƮ |
D. | n2cƮ |
Answer» C. nr2cƮ | |
4. |
If f assumes the value e then delay is |
A. | maximized |
B. | minimized |
C. | does not change |
D. | doubled |
Answer» C. does not change | |
5. |
Which is used to increase Ʈ? |
A. | parasitic capacitance |
B. | peripheral capacitance |
C. | area capacitance |
D. | load capacitance |
Answer» B. peripheral capacitance | |
6. |
What is the delay value Ʈ for 1.2 micron technology? |
A. | 0.1 nsec |
B. | 0.12 nsec |
C. | 0.046 nsec |
D. | 0.064 nsec |
Answer» D. 0.064 nsec | |
7. |
1 square Cg is ___________ of MOS transistor. |
A. | gate to source capacitance |
B. | gate to drain capacitance |
C. | source to drain capacitance |
D. | gate to channel capacitance |
Answer» E. | |
8. |
PROPOGATION_DELAY_IS_GIVEN_BY?$ |
A. | nrcƮ |
B. | n<sup>2</sup>rcƮ |
C. | nr<sup>2</sup>cƮ |
D. | n<sup>2</sup>cƮ |
Answer» C. nr<sup>2</sup>c‚Äö√†√ú‚àö√ú | |
9. |
One pass transistor can be driven through output of another.$ |
A. | true |
B. | false |
Answer» C. | |
10. |
Using _____ long wires are possible$ |
A. | silicide |
B. | metal |
C. | polysilicon |
D. | diffusion |
Answer» B. metal | |
11. |
Maximum allowable current density in aluminium is |
A. | 0.1 mA/µm2 |
B. | 0.5 mA/µm2 |
C. | 2 mA/µm2 |
D. | 1 mA/µm2 |
Answer» E. | |
12. |
Pass transistors are allowed to be constructed under |
A. | diffusion layer |
B. | polysilicon layer |
C. | metal layer |
D. | silicon layer |
Answer» D. silicon layer | |
13. |
If f assumes the value e then delay i? |
A. | maximized |
B. | minimized |
C. | does not change |
D. | doubled |
Answer» C. does not change | |
14. |
The number of stages N is given by |
A. | ln(y)/ln(f) |
B. | ln(f)/ln(y) |
C. | ln(2y)/ln(f) |
D. | ln(y)/ln(2f) |
Answer» B. ln(f)/ln(y) | |
15. |
The inverter pair delay is given by |
A. | (Zp.u./Zp.d.)Ʈ |
B. | (1+ Zp.u./Zp.d.)Ʈ |
C. | (1+ Zp.u./Zp.d.)Ʈ |
D. | (1+ Ʈ)Zp.u./Zp.d. |
Answer» C. (1+ Zp.u./Zp.d.)‚Äö√†√ú‚àö√ú | |
16. |
Which is used to increase Ʈ?$ |
A. | parasitic capacitance |
B. | peripheral capacitance |
C. | area capacitance |
D. | load capacitance |
Answer» B. peripheral capacitance | |
17. |
What is the delay value Ʈ for 1.2 micron technology?$ |
A. | 0.1 nsec |
B. | 0.12 nsec |
C. | 0.046 nsec |
D. | 0.064 nsec |
Answer» D. 0.064 nsec | |
18. |
1 square Cg is ______ of MOS transistor |
A. | gate to source capacitance |
B. | gate to drain capacitance |
C. | source to drain capacitance |
D. | gate to channel capacitance |
Answer» E. | |
19. |
What is the value for peripheral capacitance for 5 micron technology? |
A. | 4 x 10<sup>(-4)</sup> pf/µm2 |
B. | 5 x 10<sup>(-4)</sup> pf/µm2 |
C. | 8 x 10<sup>(-4)</sup> pf/µm2 |
D. | 12 x 10<sup>(-4)</sup> pf/µm2 |
Answer» D. 12 x 10<sup>(-4)</sup> pf/¬¨¬®¬¨¬µm2 | |
20. |
The impedance ratio for pseudo-nMOS is |
A. | 4:1 |
B. | 3:1 |
C. | 1:4 |
D. | 1:3 |
Answer» C. 1:4 | |
21. |
The Zp.u./Zp.d. ratio for nMOS inverter is |
A. | 4:1 |
B. | 3:1 |
C. | 1:4 |
D. | 1:3 |
Answer» B. 3:1 | |