 
			 
			MCQOPTIONS
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				This section includes 24 Mcqs, each offering curated multiple-choice questions to sharpen your Vlsi knowledge and support exam preparation. Choose a topic below to get started.
| 1. | Which of the following parameters are found using load capacitance? | 
| A. | Delay time | 
| B. | Power consumption | 
| C. | Speed of the CMOS logic | 
| D. | All of the mentioned | 
| Answer» E. | |
| 2. | Interconnect capacitance is formed due to ___________ | 
| A. | Junction capacitance between gate and substrate | 
| B. | Wire connecting the gates of 2 different inverters | 
| C. | Parasitic capacitance existing between metal and polysilicon connection between 2 inverters | 
| D. | All of the mentioned | 
| Answer» D. All of the mentioned | |
| 3. | Interconnect capacitance contributes to the load capacitance when the CMOS inverters are connected in cascade configuration. | 
| A. | True | 
| B. | False | 
| Answer» B. False | |
| 4. | The load capacitance is equivalent to ___________ | 
| A. | Sum of all lumped linear capacitances between input and output node | 
| B. | Sum of all junction capacitance between Vcc and ground | 
| C. | Sum of all junction capacitance between input and output | 
| D. | Sum of all lumped linear capacitances between output node and ground | 
| Answer» B. Sum of all junction capacitance between Vcc and ground | |
| 5. | The load capacitance is measured between ___________ | 
| A. | Output node and input node | 
| B. | Output node and Vcc | 
| C. | Output node and ground | 
| D. | Input node and ground | 
| Answer» D. Input node and ground | |
| 6. | In the below graph, the regions marked as A,B,C are? | 
| A. | A : Saturation, B : Linear, C : Cut-off | 
| B. | A :Cut-off, B : Linear, C : Saturation | 
| C. | A : Linear, B : Saturation, C : Cut-off | 
| D. | None of the mentioned | 
| Answer» C. A : Linear, B : Saturation, C : Cut-off | |
| 7. | When MOSFET is operating in saturation region, the gate to source capacitance is? | 
| A. | 1/2*Cox*W*L | 
| B. | 2/3*Cox*W*L | 
| C. | Cox*W*L | 
| D. | 1/3*Cox*W*L | 
| Answer» C. Cox*W*L | |
| 8. | In saturation mode operation, gate to drain capacitance is zero due to ___________ | 
| A. | Gate and drain are interconnected | 
| B. | Channel length is reduced | 
| C. | Inversion layer doesn’t exist | 
| D. | Drain is connected to ground | 
| Answer» C. Inversion layer doesn’t exist | |
| 9. | In linear mode operation, the parasitic capacitances that exists are ___________ | 
| A. | Nonzero Gate to source capacitance | 
| B. | Nonzero Gate to drain capacitance | 
| C. | Zero gate to substrate capacitance | 
| D. | All of the mentioned | 
| Answer» E. | |
| 10. | In cut-off mode, the value of gate to substrate capacitance is equal to ___________ | 
| A. | Cox .(W- L) | 
| B. | Cox W/ L | 
| C. | Cox* W*L | 
| D. | 0 | 
| Answer» D. 0 | |
| 11. | In Cut-off Mode, the capacitance Cgs will be equal to ___________ | 
| A. | 2Cgd | 
| B. | 0 | 
| C. | Cgb | 
| D. | All of the mentioned | 
| Answer» C. Cgb | |
| 12. | The capacitance that exist between Gate and Bulk is called as ___________ | 
| A. | Oxide parasitic capacitance | 
| B. | Metal oxide capacitance | 
| C. | MOS capacitance | 
| D. | None of the mentioned | 
| Answer» B. Metal oxide capacitance | |
| 13. | The parasitic capacitances found in MOSFET are ___________ | 
| A. | Oxide related capacitances | 
| B. | Inter electrode capacitance | 
| C. | Electrolytic capacitance | 
| D. | All of the mentioned | 
| Answer» B. Inter electrode capacitance | |
| 14. | The capacitances in MOSFET occurs due to _____________ | 
| A. | Interconnects | 
| B. | Difference in Doping concentration | 
| C. | Difference in dopant materials | 
| D. | All of the mentioned | 
| Answer» E. | |
| 15. | WHEN_MOSFET_IS_OPERATING_IN_SATURATION_REGION,_THE_GATE_TO_SOURCE_CAPACITANCE_IS_:?$ | 
| A. | 1/2*Cox*W*L | 
| B. | 2/3*Cox*W*L | 
| C. | Cox*W*L | 
| D. | 1/3*Cox*W*L | 
| Answer» C. Cox*W*L | |
| 16. | Interconnect capacitance is formed due to: | 
| A. | Junction capacitance between gate and substrate | 
| B. | Wire connecting the gates of 2 different inverters | 
| C. | Parasitic capacitance existing between metal and polysilicon connection between 2 inverters | 
| D. | All of the mentioned | 
| Answer» E. | |
| 17. | The load capacitance is equivalent to: | 
| A. | Sum of all lumped linear capacitances between input and output node | 
| B. | Sum of all junction capacitance between Vcc and ground | 
| C. | Sum of all junction capacitance between input and output | 
| D. | Sum of all lumped linear capacitances between output node and ground | 
| Answer» B. Sum of all junction capacitance between Vcc and ground | |
| 18. | In saturation mode operation, gate to drain capacitance is zero due to? | 
| A. | Gate and drain are interconnected | 
| B. | Channel length is reduced | 
| C. | Inversion layer doesn’t exit | 
| D. | Drain is connected to ground | 
| Answer» C. Inversion layer doesn‚Äö√Ñ√∂‚àö√ë‚àö¬•t exit | |
| 19. | Nonzero Gate to source capacitance | 
| A. | Nonzero Gate to drain capacitance | 
| B. | Zero gate to substrate capacitance | 
| C. | All of the mentioned | 
| Answer» C. All of the mentioned | |
| 20. | In cut-off mode, the value of gate to substrate capacitance is equal to: | 
| A. | Cox .(W- L) | 
| B. | Cox W/ L | 
| C. | Cox* W*L | 
| D. | 0 | 
| Answer» D. 0 | |
| 21. | In Cut-off Mode, the capacitance Cgs will be equal to: | 
| A. | 2Cgd | 
| B. | 0 | 
| C. | Cgb | 
| D. | All of the mentioned | 
| Answer» C. Cgb | |
| 22. | The capacitance that exist between Gate and Bulk is called as: | 
| A. | Oxide parasitic capacitance | 
| B. | Metal oxide capacitance | 
| C. | MOS capacitance | 
| D. | None of the mentioned | 
| Answer» B. Metal oxide capacitance | |
| 23. | The parasitic capacitances found in MOSFET are: | 
| A. | Oxide related capacitances | 
| B. | Inter electrode capacitance | 
| C. | Electrolytic capacitance | 
| D. | All of the mentioned | 
| Answer» B. Inter electrode capacitance | |
| 24. | The capacitances in MOSFET occurs due to: | 
| A. | Interconnects | 
| B. | Difference in Doping concentration | 
| C. | Difference in dopant materials | 
| D. | All of the mentioned | 
| Answer» E. | |