MCQOPTIONS
Saved Bookmarks
| 1. |
The primary reason for the widespread use of Si in semiconductor device technology is |
| A. | abundance of Si on the surface of earth |
| B. | larger band gap of Si in comparison to Ge |
| C. | favourable properties of Silicon-dioxide (SiO₂) |
| D. | lower melting point |
| Answer» D. lower melting point | |