Consider the following statements.The functions of an oxide layer in an IC device is to 1. mask against diffusion or ion implant2. insulate the surface electrically3. increase the melting point of silicon4. produce a chemically stable protective layer Of these statements, which are true.

Consider the following statements.The functions of an oxide layer in a

1.	Consider the following statements.The functions of an oxide layer in an IC device is to 1. mask against diffusion or ion implant2. insulate the surface electrically3. increase the melting point of silicon4. produce a chemically stable protective layer Of these statements, which are true.
A.	1, 2, 3
B.	1, 3, 4
C.	2, 3, 4
D.	1, 2, 4
Answer» E.