Consider the following statements: The function of oxide layer in an IC device is to 1. mask against diffusion or non implant2. insulate the surface electrically3. increase the melting point of silicon4. produce a chemically stable protective layer Of these statements:

• A. 1, 2, 3 are correct
• B. 1, 3, 4 are correct
• C. 2, 3, 4 are correct
• D. 1, 2, 4 are correct