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This section includes 8 Mcqs, each offering curated multiple-choice questions to sharpen your Vlsi knowledge and support exam preparation. Choose a topic below to get started.
1. |
Processing of the device is better using ___________ |
A. | polysilicon |
B. | silicides |
C. | polysilicon & silicides |
D. | none of the mentioned |
Answer» B. silicides | |
2. |
Deposition of metal can be done by co-evaporation. |
A. | true |
B. | false |
Answer» B. false | |
3. |
Deposition of metal or silicon alloy can be done by ___________ |
A. | sputtering |
B. | evaporation |
C. | sputtering and evaporation |
D. | deposition should not be made |
Answer» D. deposition should not be made | |
4. |
Z can be given as the ration of ___________ |
A. | lower channel by upper channel |
B. | upper channel by lower channel |
C. | all of the mentioned |
D. | none of the mentioned |
Answer» C. all of the mentioned | |
5. |
For 1.2 micron technology, what is the Rs value for diffusion? |
A. | 20-40 |
B. | 20-45 |
C. | 15-30 |
D. | 25-50 |
Answer» C. 15-30 | |
6. |
For 2 micron technology, what is the Rs value for polysilicon? |
A. | 10-40 |
B. | 20-50 |
C. | 15-30 |
D. | 15-100 |
Answer» D. 15-100 | |
7. |
For 5 micron technology, What is the Rs value for a metal? |
A. | 0.03 |
B. | 0.04 |
C. | 0.02 |
D. | 0.01 |
Answer» B. 0.04 | |
8. |
Area A of a slab can be given as ____________ |
A. | t * W |
B. | t / W |
C. | L * W |
D. | L * t |
Answer» B. t / W | |