MCQOPTIONS
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				| 1. | 
                                    The primary reason for the widespread use of Si in semiconductor device technology is | 
                            
| A. | abundance of Si on the surface of earth | 
| B. | larger band gap of Si in comparison to Ge | 
| C. | favourable properties of Silicon-dioxide (SiO2) | 
| D. | lower melting point | 
| Answer» D. lower melting point | |