Consider the following statements.The functions of an oxide layer in an IC device is to mask against diffusion or ion implantinsulate the surface electricallyincrease the melting point of siliconproduce a chemically stable protective layer of these statements.

Consider the following statements.The functions of an oxide layer in a

1.	Consider the following statements.The functions of an oxide layer in an IC device is to mask against diffusion or ion implantinsulate the surface electricallyincrease the melting point of siliconproduce a chemically stable protective layer of these statements.
A.	1, 2, 3
B.	1, 3, 4
C.	2, 3, 4
D.	1, 2, 4
Answer» E.