Low pressure chemical vapour deposition (LPCVD) is used to_____

Question

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NA

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increase the purity of the film

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to reduce the roughness of the film

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to form thick films

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to reduce stress on the film

1.	Low pressure chemical vapour deposition (LPCVD) is used to_____
A.	increase the purity of the film
B.	to reduce the roughness of the film
C.	to form thick films
D.	to reduce stress on the film
Answer» E.

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