How a uniform film with good crystal structure is attained in cathode sputtering process?

Question

TuteeHUB · Accepted Answer

Heavy inert gas is used for film deposition on the substrate

TuteeHUB · Answer

By hitting high energy particle directly on the substrate

TuteeHUB · Answer

Allowing Less time for the particles to deposit on the substrate

TuteeHUB · Answer

High energy particle diffuse through low pressure gas and deposits on the substrate

1.	How a uniform film with good crystal structure is attained in cathode sputtering process?
A.	By hitting high energy particle directly on the substrate
B.	Allowing Less time for the particles to deposit on the substrate
C.	High energy particle diffuse through low pressure gas and deposits on the substrate
D.	Heavy inert gas is used for film deposition on the substrate
Answer» D. Heavy inert gas is used for film deposition on the substrate

Discussion