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This section includes 13 Mcqs, each offering curated multiple-choice questions to sharpen your Electronic Devices Circuits knowledge and support exam preparation. Choose a topic below to get started.
1. |
The grown junction type transistors is generally used for_________ |
A. | PNP transistors |
B. | NPN transistors |
C. | Both transistors |
D. | Depends on the material used |
Answer» C. Both transistors | |
2. |
The electrical properties of a transistor in alloy type construction is determined by_________ |
A. | space between the junctions in the wafer |
B. | proportions of N and P type impurities |
C. | the pulling rate of crystal |
D. | uniformity of the crystal lattice |
Answer» B. proportions of N and P type impurities | |
3. |
The larger dot of the indium is used as_________ |
A. | base |
B. | emitter |
C. | control pin |
D. | collector |
Answer» E. | |
4. |
THE_ELECTRICAL_PROPERTIES_OF_A_TRANSISTOR_IN_ALLOY_TYPE_CONSTRUCTION_IS_DETERMINED_BY_________?$ |
A. | space between the junctions in the wafer |
B. | proportions of N and P type impurities |
C. | the pulling rate of crystal |
D. | uniformity of the crystal lattice |
Answer» B. proportions of N and P type impurities | |
5. |
The_grown_junction_type_transistors_is_generally_used_for_________$ |
A. | PNP transistors |
B. | NPN transistors |
C. | Both transistors |
D. | Depends on the material used |
Answer» C. Both transistors | |
6. |
The larger dot of the indium is used as________? |
A. | base |
B. | emitter |
C. | control pin |
D. | collector |
Answer» E. | |
7. |
What is the thickness of wafer in the alloy type transistors? |
A. | 1-2m inch |
B. | 3-5m inch |
C. | 5-6m inch |
D. | 4-7m inch |
Answer» C. 5-6m inch | |
8. |
The non rectifying base contact is made from_________ |
A. | welding a strip |
B. | germanium |
C. | indium |
D. | graphite |
Answer» B. germanium | |
9. |
What is the melting point of indium in alloy type transistors? |
A. | 300°C |
B. | 200°C |
C. | 155°C |
D. | 100°C |
Answer» D. 100¬¨¬®‚Äö√†√ªC | |
10. |
Which of the following is true about grown junction type construction? |
A. | N type impurity is added to P type impurity |
B. | Boron helps in the prevention of oxidation |
C. | The seed is pulled to a large distance for a correct growth |
D. | Slow pulling leads to the formation of P type crystal |
Answer» E. | |
11. |
Which of the following methods take impurity variation method for transistor construction? |
A. | alloy type diffusion |
B. | grown junction type |
C. | epitaxial type |
D. | mesa type |
Answer» C. epitaxial type | |
12. |
In a grown junction type construction, the method used form a junction transistor is_________ |
A. | alloy type diffusion |
B. | mesa type |
C. | speed variation method |
D. | fused junction type |
Answer» D. fused junction type | |
13. |
Which gas is used to fill the chamber in the grown junction type transistor construction? |
A. | helium |
B. | boron |
C. | nitrogen |
D. | oxygen |
Answer» D. oxygen | |