Explore topic-wise MCQs in Manufacturing Processes.

This section includes 5 Mcqs, each offering curated multiple-choice questions to sharpen your Manufacturing Processes knowledge and support exam preparation. Choose a topic below to get started.

1.

During post treatment of MpSi, a layer of silicon dioxide is formed.

A. True
B. False
Answer» B. False
Discussion
2.

Post-treatment starts with a thermal treatment of the MpSi structure at _____

A. 900 C
B. 1100 C
C. 1570 C
D. 1650 C
Answer» C. 1570 C
Discussion
3.

If the etching conditions are not controlled, then _____ decreases with pore depth.

A. the period length
B. diameter of the pores
C. orderliness of the pores
D. reflectivity of the material
Answer» B. diameter of the pores
Discussion
4.

Which of the following is true according to the Lehmann s model for the formation of MpSi?

A. The current density is equal to the critical current density
B. The current density is half of the critical current density
C. The critical current density is equal to square of the current density
D. Lehmann s model does not give relation between current density and critical current density
Answer» B. The current density is half of the critical current density
Discussion
5.

Cone-like pores can be obtained by using Lehmann s law.

A. True
B. False
Answer» B. False
Discussion