MCQOPTIONS
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MCQOPTIONS
This section includes 5 Mcqs, each offering curated multiple-choice questions to sharpen your Manufacturing Processes knowledge and support exam preparation. Choose a topic below to get started.
| 1. |
During post treatment of MpSi, a layer of silicon dioxide is formed. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 2. |
Post-treatment starts with a thermal treatment of the MpSi structure at _____ |
| A. | 900 C |
| B. | 1100 C |
| C. | 1570 C |
| D. | 1650 C |
| Answer» C. 1570 C | |
| 3. |
If the etching conditions are not controlled, then _____ decreases with pore depth. |
| A. | the period length |
| B. | diameter of the pores |
| C. | orderliness of the pores |
| D. | reflectivity of the material |
| Answer» B. diameter of the pores | |
| 4. |
Which of the following is true according to the Lehmann s model for the formation of MpSi? |
| A. | The current density is equal to the critical current density |
| B. | The current density is half of the critical current density |
| C. | The critical current density is equal to square of the current density |
| D. | Lehmann s model does not give relation between current density and critical current density |
| Answer» B. The current density is half of the critical current density | |
| 5. |
Cone-like pores can be obtained by using Lehmann s law. |
| A. | True |
| B. | False |
| Answer» B. False | |