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This section includes 2 Mcqs, each offering curated multiple-choice questions to sharpen your Manufacturing Processes knowledge and support exam preparation. Choose a topic below to get started.
1. |
Low pressure chemical vapour deposition (LPCVD) is used to_____ |
A. | increase the purity of the film |
B. | to reduce the roughness of the film |
C. | to form thick films |
D. | to reduce stress on the film |
Answer» E. | |
2. |
In chemical vapour deposition, chemicals containing the desired film/layer are used. |
A. | True |
B. | False |
Answer» B. False | |