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This section includes 10 Mcqs, each offering curated multiple-choice questions to sharpen your Manufacturing Processes knowledge and support exam preparation. Choose a topic below to get started.
1. |
In hole injection mechanism, holes are created in the noble metal. |
A. | True |
B. | False |
Answer» B. False | |
2. |
In the above mentioned method, charge transfer between noble metal and silicon occurs for the oxidation. |
A. | True |
B. | False |
Answer» B. False | |
3. |
In metal-assisted etching of pSi, the noble metal works as a cathode. |
A. | True |
B. | False |
Answer» B. False | |
4. |
In metal-assisted etching of pSi, chemical reactions occur between _____ |
A. | noble metal and etching agent |
B. | silicon and etching agent |
C. | noble metal and silicon |
D. | no such reactions occur in metal-assisted etching |
Answer» D. no such reactions occur in metal-assisted etching | |
5. |
Geometric features of the pSi structure are determined by noble metal mask. |
A. | True |
B. | False |
Answer» B. False | |
6. |
Etching rate is affected by _____ |
A. | temperature |
B. | pressure |
C. | coating on Si surface |
D. | material thickness |
Answer» D. material thickness | |
7. |
It can be said that metal-assisted etching of silicon is an alternative approach to conventional electrochemical etching methods. |
A. | True |
B. | False |
Answer» B. False | |
8. |
Metal-assisted etching can produce pSi structures with high surface-to-volume ratio. |
A. | True |
B. | False |
Answer» B. False | |
9. |
_____ can be controlled in metal-assisted etching. |
A. | Etching rate |
B. | Etching direction |
C. | Etching area |
D. | Etching temperature |
Answer» C. Etching area | |
10. |
Metal-assisted chemical etching approach is widely used to produce pSi structures with precisely defined geometric features. |
A. | True |
B. | False |
Answer» B. False | |