Explore topic-wise MCQs in Manufacturing Processes.

This section includes 10 Mcqs, each offering curated multiple-choice questions to sharpen your Manufacturing Processes knowledge and support exam preparation. Choose a topic below to get started.

1.

Thickness of layers in the mpSi and pSi structures can be controlled by_____

A. current density
B. etching agent
C. etching time
D. porosity
Answer» D. porosity
2.

The effective refractive index of pSi can be varied with the current density.

A. True
B. False
Answer» B. False
3.

pSi and mpSi structures are widely used to produce optical structure.

A. True
B. False
Answer» B. False
4.

The porosity of mpSi and pSi relies mainly on the ______________

A. thickness of the material
B. current density
C. etching agent
D. temperature
Answer» C. etching agent
5.

The refractive index of mpSi and pSi structures has some anisotropy.

A. True
B. False
Answer» B. False
6.

The effective medium concept, where the optical properties of the material are established by its ________________

A. pore distribution in the structure
B. band gap
C. pore thickness
D. wavelength of the incident light
Answer» C. pore thickness
7.

In pSi structures, depletion of holes is affected by the energy barrier generated in the wall region.

A. True
B. False
Answer» B. False
8.

In the quantum confinement model for pSi structures, energy band gap in the wall region varies.

A. True
B. False
Answer» B. False
9.

pSi structures have _____________

A. high porosity
B. longer life
C. organised pores
D. low density
Answer» B. longer life
10.

Pore formation in pSi is independent of quantum confinement.

A. True
B. False
Answer» C.