MCQOPTIONS
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MCQOPTIONS
This section includes 10 Mcqs, each offering curated multiple-choice questions to sharpen your Manufacturing Processes knowledge and support exam preparation. Choose a topic below to get started.
| 1. |
High aspect ratios are not possible with SU-8 material. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 2. |
At higher particle velocities, adhesion between the mask and the workpiece material becomes weak. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 3. |
Elastomers are suitable for high air pressures. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 4. |
Feature width is the major drawback of metal masks. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 5. |
Structures with high aspect ratios are possible with _____ |
| A. | photo-resist material |
| B. | metals |
| C. | elastomers |
| D. | porous silicon |
| Answer» C. elastomers | |
| 6. |
SU-8 is most commonly used negative resist. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 7. |
After treatment with UV light, resist is washed away by the developer solution. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 8. |
Positive resists are formed when resist is exposed to UV light. |
| A. | True |
| B. | False |
| Answer» B. False | |
| 9. |
Photo-resists are _____ materials. |
| A. | photogenic |
| B. | photosensitive |
| C. | photo-dissociate |
| D. | photo-emissive |
| Answer» C. photo-dissociate | |
| 10. |
Elastomer masks are provided in the form of foils. |
| A. | True |
| B. | False |
| Answer» B. False | |