

MCQOPTIONS
Saved Bookmarks
1. |
TO_ETCH_THE_SURFACE_OF_SILICON_WAFERS_AT_SPECIFIC_POSITIONS_BY_METAL-ASSISTED_ETCHING,_NANO-POROUS_ANODIC_ALUMINA_(NAA)_MASK_TECHNIQUE_IS_USED.?$ |
A. | True |
B. | False |
Answer» B. False | |