MCQOPTIONS
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| 1. |
TO_ETCH_THE_SURFACE_OF_SILICON_WAFERS_AT_SPECIFIC_POSITIONS_BY_METAL-ASSISTED_ETCHING,_NANO-POROUS_ANODIC_ALUMINA_(NAA)_MASK_TECHNIQUE_IS_USED.?$ |
| A. | True |
| B. | False |
| Answer» B. False | |