MCQOPTIONS
Saved Bookmarks
| 1. |
In MOSFET fabrication, the channel length is defined during the process of |
| A. | isolation oxide growth |
| B. | channel stop implantation |
| C. | poly-silicon gate patterning |
| D. | lithography step leading to the contact pads |
| Answer» D. lithography step leading to the contact pads | |