Following are the incident radiation used for lithography while making integrated circuit (depending upon the feature size).(a) Visible light(b) Electron beam(c) Ion beam(d) UV lightSequence the radiation used for increasing order of the feature size:

Following are the incident radiation used for lithography while making

1.	Following are the incident radiation used for lithography while making integrated circuit (depending upon the feature size).(a) Visible light(b) Electron beam(c) Ion beam(d) UV lightSequence the radiation used for increasing order of the feature size:
A.	(c), (b), (d), (a)
B.	(b), (a), (d), (c)
C.	(a), (b), (c), (d)
D.	(a), (d), (b), (c)
Answer» B. (b), (a), (d), (c)