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This section includes 20 Mcqs, each offering curated multiple-choice questions to sharpen your Advanced Machining knowledge and support exam preparation. Choose a topic below to get started.
1. |
State whether the following statement is true or false about etchants.“Etchants are used for controlling H2 absorption in case of Ti alloys.” |
A. | True |
B. | False |
Answer» B. False | |
2. |
Which of the following, are the main uses of etchants applied in Chemical milling? |
A. | Good surface finish |
B. | Uniform material removal |
C. | Control intergranular attack |
D. | All of the mentioned |
Answer» E. | |
3. |
Which of the tolerance values are obtained, when we use photo resist method for maskant application? |
A. | ± 0.013 mm |
B. | ± 0.045 mm |
C. | ± 0.077 mm |
D. | ± 0.179 mm |
Answer» B. ± 0.045 mm | |
4. |
Which of the tolerance values are obtained, when we use silk-screen resist method for maskant? |
A. | ± 0.013 mm |
B. | ± 0.045 mm |
C. | ± 0.077 mm |
D. | ± 0.179 mm |
Answer» D. ± 0.179 mm | |
5. |
State whether the following statement is true or false regarding maskants.“After etching, maskants should be removed easily and inexpensively.” |
A. | True |
B. | False |
Answer» B. False | |
6. |
State which of the following statement is true or false regarding Chemical milling.“Maskants are generally used in CHM, to protect the work piece from the etching chemical agent.” |
A. | True |
B. | False |
Answer» B. False | |
7. |
WHICH_OF_THE_TOLERANCE_VALUES_ARE_OBTAINED,_WHEN_WE_USE_PHOTO_RESIST_METHOD_FOR_MASKANT_APPLICATION??$ |
A. | ± 0.013 mm |
B. | ± 0.045 mm |
C. | ± 0.077 mm |
D. | ± 0.179 mm |
Answer» B. ¬¨¬®¬¨¬± 0.045 mm | |
8. |
State whether the following statement is true or false about etchants.$ |
A. | |
B. | True |
Answer» B. True | |
9. |
Which of the following, are the main uses of etchants applied in Chemical milling?$ |
A. | Good surface finish |
B. | Uniform material removal |
C. | Control intergranular attack |
D. | All of the mentioned |
Answer» E. | |
10. |
Which of the following are the accessories, included in the tooling of Chemical milling? |
A. | Tanks and hooks |
B. | Brackets and racks |
C. | Fixtures |
D. | All of the mentioned |
Answer» E. | |
11. |
Which of the following are can be used as guides for scribing process in Chemical milling? |
A. | Layout lines |
B. | Simple templates |
C. | Fibre glass |
D. | All of the mentioned |
Answer» E. | |
12. |
Scribing plates are used to define, which of the following parameters in Chemical milling? |
A. | Areas to be exposed |
B. | Volumes to be exposed |
C. | Areas not to be exposed |
D. | Volumes not to be exposed |
Answer» B. Volumes to be exposed | |
13. |
Which of the tolerance values are obtained, when we use cut and peel mask method for maskant? |
A. | ± 0.013 mm |
B. | ± 0.045 mm |
C. | ± 0.077 mm |
D. | ± 0.179 mm |
Answer» E. | |
14. |
In maskant application, photo-resist masks ensure which of the following advantages? |
A. | High accuracy |
B. | Ease of repetition |
C. | Ease of modification |
D. | All of the mentioned |
Answer» E. | |
15. |
State whether following statement is true or false regarding maskants. |
A. | |
B. | True |
Answer» B. True | |
16. |
Which of the following can be used to apply the maskants on work piece in Chemical milling? |
A. | Dipping or spraying |
B. | Rolling or electro coating |
C. | Adhesive tapes |
D. | All of the mentioned |
Answer» E. | |
17. |
What are the properties that a maskant used in Chemical milling should possess? |
A. | Be tough and adhere well |
B. | Scribe easily |
C. | Be inert to chemical reagent |
D. | All of the mentioned |
Answer» E. | |
18. |
Which of the following are the materials used for making maskants? |
A. | Synthetic materials |
B. | Rubber materials |
C. | Polymeric materials |
D. | All of the mentioned |
Answer» E. | |
19. |
State which of the following statement is true or false regarding Chemical milling. |
A. | |
B. | True |
Answer» B. True | |
20. |
Which of the following are the tools required for Chemical milling? |
A. | Maskants |
B. | Etchants |
C. | Scribing plates |
D. | All of the mentioned |
Answer» E. | |