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This section includes 6 Mcqs, each offering curated multiple-choice questions to sharpen your Linear Integrated Circuit knowledge and support exam preparation. Choose a topic below to get started.
1. |
Which method is most suitable for silicon crystal growth in silicon wafer preparation? |
A. | Float zone process |
B. | Bridgeman-Stockbarger method |
C. | Czochralski crystal growth process |
D. | Laser heated pedestal growth |
Answer» D. Laser heated pedestal growth | |
2. |
In which method shallow penetration of dopants is possible? |
A. | Ion implantation |
B. | Vertical diffusion |
C. | Horizontal diffusion |
D. | Dopants diffusion |
Answer» B. Vertical diffusion | |
3. |
During ion implantation process (before the ion strike the wafer) the accelerated ions are passed through |
A. | Strong Electric field |
B. | Strong Magnetic field |
C. | Strong Electric and Magnetic Field |
D. | None of the mentioned |
Answer» C. Strong Electric and Magnetic Field | |
4. |
What will be the next step after slicing (process) silicon wafers? |
A. | All of the mentioned |
B. | Lapping |
C. | Polishing |
D. | Chemical |
Answer» B. Lapping | |
5. |
Pick out the incorrect statement
|
A. | Relatively a good conductor |
B. | High resistance |
C. | Good mechanical bond with silicon |
D. | Deposition of aluminium film using vacuum deposition |
Answer» D. Deposition of aluminium film using vacuum deposition | |
6. |
The major disadvantage of PN-junction isolation technique is: |
A. | Formation of Parasitic Resistance |
B. | Formation of Parasitic Capacitance |
C. | Formation of Isolation island |
D. | None of the mentioned |
Answer» C. Formation of Isolation island | |