Explore topic-wise MCQs in Linear Integrated Circuit.

This section includes 13 Mcqs, each offering curated multiple-choice questions to sharpen your Linear Integrated Circuit knowledge and support exam preparation. Choose a topic below to get started.

1.

STATE_THE_CORRECT_REASON_FOR_NEGLECTING_PNP_TRANSISTOR.?$

A. Increase in the series collector resistance of pnp transistor
B. Parasitic capacitance appears between collector and substrate
C. Current gain of pnp transistor is as low as 1.5 to 30
D. None of the mentioned
Answer» D. None of the mentioned
2.

The advantage of Multi-emitter transistor is$

A. To reduce fabrication steps
B. To save chip area
C. To lower design consideration
D. To provide linear output
Answer» C. To lower design consideration
3.

The diffusion of collector impurities in npn transistor should be small because,$

A. No additional diffusion or masking steps required
B. Bandwidth is controlled by lateral diffusion of p-type impurity
C. Collector need not be kept at negative potential
D. None of the mentioned
Answer» E.
4.

Choose the appropriate value of diode to get a speedy diode from the given values of storage time (n) in sec and forward voltage (V γ).$

A. n = 56 , V<sub> γ</sub> = 0.96
B. n = 100 , V<sub> γ</sub> = 0.92
C. n = 9 , V<sub> γ</sub> = 0.85
D. n = 53 , V<sub> γ</sub> = 0.95
Answer» D. n = 53 , V<sub> ‚âà√≠‚Äö√¢‚Ä¢</sub> = 0.95
5.

Which transistor is best suitable to achieve very fast switching in digital circuits?

A. Lateral pnp transistor
B. Schottky transistor
C. Multi-emitter transistor
D. NPN transistor
Answer» C. Multi-emitter transistor
6.

Which method is used in the fabrication of pnp transistor?

A. Vertical substrate pnp
B. Triple diffused pnp
C. Lateral pnp
D. All of the mentioned
Answer» E.
7.

At what potential, the substrate of a vertical pnp transistor should be kept to attain good isolation?

A. Same potential
B. Positive potential
C. Different potential
D. Negative potential
Answer» E.
8.

The ‘buried layer’ reduces collector series resistance by providing,$

A. A low resistivity current path from n-type layer to n<sup>+</sup> contact layer
B. A low resistivity current path from p-type layer to n<sup>+</sup> contact layer
C. A high resistivity current path from n-type layer to n<sup>+</sup> contact layer
D. A high resistivity current path from p-type layer to n<sup>+</sup> contact layer
Answer» B. A low resistivity current path from p-type layer to n<sup>+</sup> contact layer
9.

Which of the following transistor has the limitation, due to the requirement of additional fabrication steps and design consideration?

A. Vertical pnp transistor
B. Lateral pnp transistor
C. Triple diffused pnp transistor
D. Substrate pnp transistor
Answer» D. Substrate pnp transistor
10.

What is the reason for using Lateral pnp transistor in Integrated Circuits?

A. Requires simple process control
B. Simultaneous fabrication of pnp and npn transistors
C. Provide good isolation
D. Miniaturization and cost reduction
Answer» C. Provide good isolation
11.

Name the process that is used to overcome the increase in collector series resistance, which occurs due to the presence of collector contact at the top of integrated transistor.

A. Buried n<sup>+</sup> layer
B. Buried p<sup>+</sup> layer
C. Triple diffused layer
D. Buried epitaxial layer
Answer» B. Buried p<sup>+</sup> layer
12.

Why monolithic IC transistor is preferred over discrete planar epitaxial transistor?

A. Due to structural difference
B. Increase in V<sub>CE</sub> (sat) and collector series resistor
C. Improvement in circuit performance
D. All of the mentioned
Answer» E.
13.

Which is the most striking feature in monolithic integrated circuit transistor?

A. Collector contact is present at the bottom of IC
B. Collector contact is present at the top of IC
C. Collector contact is absent
D. Collector contact is present on one of the sides of IC
Answer» C. Collector contact is absent